BEGIN:VCALENDAR
VERSION:2.0
CALSCALE:GREGORIAN
PRODID:UW-Madison-Physics-Events
BEGIN:VEVENT
SEQUENCE:1
UID:UW-Physics-Event-6948
DTSTART:20220606T160000Z
DTEND:20220606T180000Z
DTSTAMP:20260414T114415Z
LAST-MODIFIED:20220602T175529Z
LOCATION:Chamberlin 5310
SUMMARY:Better Qubits with ALD and ALE\, R. G. Herb Condensed Matter S
 eminar\, Dr. Russ Renzas\, Oxford Instrumetns
DESCRIPTION:Quantum device losses are predominantly from surfaces and 
 interfaces. Atomic layer deposition (ALD) enables tuneable low loss ma
 terials\, such as superconducting nitrides with engineered crystallini
 ty. Isotropic and anisotropic ALE are two distinct techniques which ca
 n each prepare and repair surfaces by removing native oxides prior to 
 deposition or removing subsurface damage from RIE-induced subsurface a
 morphization and etchant incorporation. Isotropic ALE and ALD can also
  be combined in-situ to engineer interfaces prior to deposition and mo
 dify films. This talk will introduce these techniques through the lens
  of potential use cases in superconducting\, photonic\, and color cent
 er quantum device fabrication. 
URL:https://www.physics.wisc.edu/events/?id=6948
END:VEVENT
END:VCALENDAR